Research Institute of Electrical Communication Tohoku University

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The postgraduate Tomoyuki Kawashima at Murota-Sakuraba Laboratory was awarded “Best Poster Award” by The 7th Int. Conf. on Silicon Epitaxy and Heterostructures (ICSI-7), Leuven, Belgium, Aug.28-Sep.1, 2011.

This prize is given to an individual researcher who made an excellent poster presentation on his achievement in the international academic symposium ICSI-7.

The subject matter of the awarded presentation is “Behavior of N Atoms after Thermal Nitridation of Si1-xGex Surface” .


The related page of ICSI-7 : http://www.icsi7.com/


For inquiries :

Atomically Controlled Processing,
Laboratory for Nanoelectronics and Spintronics,

Research Institute of Electrical Communication,
Tohoku University

Professor Junichi Murota

TEL : +81-22-217-5548