Research Institute of Electrical Communication Tohoku University

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Development of scanning nonlinear dielectric microscopy

 

Scanning nonlinear dielectric microscopy with atomic resolution has been developed. This microscopy has a world highest sensitivity for the capacitance variation of the order of 10e-22F. This technique can be applicable for evaluation and development of next generation high performance electronic devices, for example, flash memory, SiC & GaN power devices, solar cells and ultrahigh density ferroelectric data storage, etc..

 

http://www.d-nanodev.riec.tohoku.ac.jp/index-j.html

 

For inquiries

Dielectric Nano-Devices,Information Devices Division

Research Institute of Electrical Communication,Tohoku University

Professor Yasuo Cho E-mail:yasuocho@riec.tohoku.ac.jp