研究会名:第68回ナノ・スピン工学研究会

開催日:2013年6月27日(木)15:00~16:00

開催場所:東北大学電気通信研究所ナノ・スピン実験施設4階A401

講師:Prof. Yue Kuo (Texas A&M University)

題目:“On the Possible Generalization of TFT and ULSIC Technologies”


第68回ナノ・スピン工学研究会開催のご案内

東北大学 電気通信研究所
ナノ・スピン実験施設
ナノ集積デバイスプロセス研究部
佐藤茂雄

 

ナノ・スピン工学研究会の講演会を下記のとおり開催いたします。多数御来聴下さいますようご案内申し上げます。

  • 日時:2013年6月27日(木)15:00~16:00
  • 場所:東北大学電気通信研究所ナノ・スピン実験施設4階A401
  • 講演者:Prof. Yue Kuo(Texas A&M University)
  • 講演題目:“On the Possible Generalization of TFT and ULSIC Technologies”

 

【 Abstract 】

Currently, ICs and TFT LCDs are the largest semiconductor industries with the market values of US $300B and $120B, separately. While their basic devices are operated under the same principle, the key materials and fabrication processes are similar but different. For example, both substrates are expanded at the rate of 30% annually to 18 inches for the IC and to 3m X 3m for the TFT LCD.

The uniqueness of the IC technology lies in the high-density, high-speed transistors integrated with multilevel interconnect lines. The uniqueness of the a-Si:H TFT product is its capability of integrating devices on ultra-large size substrates at a low temperature. Recently, there are new developments in TFTs that broaden applications from pixel driving to CPUs and high speed circuits. At the same time, the large-area fabrication capability remains. In addition, a new plasma-based copper interconnect technology that is suitable for both ULSICs and TFTs has been developed. This is a good time to examine these two technologies and to explore their possible future developments. The speaker will analyze similarities and differences of these technologies and show examples on how they can learn from each other and collaborate in developing future products.

 

問い合わせ先

電気通信研究所附属ナノ・スピン実験施設
ナノ集積デバイス・プロセス研究室

櫻庭政夫

E-mail:sakuraba.masaomyad.jp

TEL:022-217-5549

開催日時 :
2013年6月27日(木)15:00~16:00
開催場所 :
東北大学電気通信研究所 ナノ・スピン実験施設4階 A401