Mr. Tomoyuki Kawashima at Murota-Sakuraba Laboratory was awarded “Award for Encouragement of Research in Material Science” by The Materials Research Society of Japan (MRS-J).
The postgraduate Tomoyuki Kawashima at Murota-Sakuraba Laboratory was awarded “Award for Encouragement of Research in Material Science” by The Materials Research Society of Japan (MRS-J).
This prize gives “Award for Encouragement of Research” to the young individual researcher who made an excellent presentation or publication by posters in the international academic symposium IUMRS-ICA2008 held by MRS-J and praises his achievement.
The subject matter of the awarded presentation is “Nitrogen Atomic-Layer Doping in Nanometer-Order Heterostructure of Si/Si1-xGex/Si(100) by Ultraclean Low-Pressure CVD”.
The related page of MRS-J : http://www.mrs-j.org/
The related page of IUMRS-ICA2008 :http://www.iumrs-ica2008.jp/
Contact
Atomically Controlled Processing,
Laboratory for Nanoelectronics and Spintronics,
Research Facilities of RIEC,
Tohoku University.
Professor Junichi Murota
TEL : 022-217-5548
