Mr. Tomoyuki Kawashima at Murota-Sakuraba Laboratory was awarded “Best Poster Award” by The 7th Int. Conf. on Silicon Epitaxy and Heterostructures.（August 31,2011）
The postgraduate Tomoyuki Kawashima at Murota-Sakuraba Laboratory was awarded “Best Poster Award” by The 7th Int. Conf. on Silicon Epitaxy and Heterostructures (ICSI-7), Leuven, Belgium, Aug.28-Sep.1, 2011.
This prize is given to an individual researcher who made an excellent poster presentation on his achievement in the international academic symposium ICSI-7.
The subject matter of the awarded presentation is “Behavior of N Atoms after Thermal Nitridation of Si1-xGex Surface” .
The related page of ICSI-7 : http://www.icsi7.com/
Contact
Atomically Controlled Processing,
Laboratory for Nanoelectronics and Spintronics,
Research Institute of Electrical Communication,
Tohoku University
Professor Junichi Murota
TEL : +81-22-217-5548
